微图形转移技术-光刻课件.ppt

1、微图形转移技术光刻微型机电系统课程系列之三卢德江西安交通大学精密工程研究所Institute of Precision Engineering,XJTU微型机电系统课程系列之三Institute of Precision Engineering,XJTU微型制造技术微型制造技术精密加工精密加工微细超声加工微细电解加工微细电火花加工立体光刻立体光刻能束加工能束加工激光加工电子束加工离子束加工 硅微细加工 硅微细加工光刻电铸加工光刻电铸加工准LIGA加工LIGA加工体硅加工硅表面微加工各向 异性 腐蚀自停止 腐蚀深层离子刻蚀电化学腐蚀等离子及反应离子刻蚀淀积光刻牺牲层腐蚀扩散微型机电系统课程系列之

2、三Institute of Precision Engineering,XJTU1 1Basic of PhotolithographyBasic of Photolithography2 2Mask FabricationMask Fabrication3 3Mask AlignerMask Aligner4 4Photolithography ProcessPhotolithography Process5 5Results JudgementResults Judgement微型机电系统课程系列之三Institute of Precision Engineering,XJTUUVUV曝光

3、曝光显影显影后续加工后续加工微型机电系统课程系列之三Institute of Precision Engineering,XJTU1 1Basic of PhotolithographyBasic of Photolithography2 2Mask FabricationMask Fabrication3 3Mask AlignerMask Aligner4 4Photolithography ProcessPhotolithography Process5 5Results JudgementResults Judgement微型机电系统课程系列之三Institute of Precisi

4、on Engineering,XJTU微型机电系统课程系列之三Institute of Precision Engineering,XJTU微型机电系统课程系列之四Institute of Precision Engineering,XJTU1 1Basic of PhotolithographyBasic of Photolithography2 2Mask FabricationMask Fabrication3 3Mask AlignerMask Aligner4 4Photolithography ProcessPhotolithography Process5 5Results Ju

5、dgementResults Judgement微型机电系统课程系列之三Institute of Precision Engineering,XJTU光源光阑快门掩模光刻胶层微型机电系统课程系列之三Institute of Precision Engineering,XJTU微型机电系统课程系列之三Institute of Precision Engineering,XJTU微型机电系统课程系列之三Institute of Precision Engineering,XJTU微型机电系统课程系列之三Institute of Precision Engineering,XJTU微型机电系统课程系

6、列之三Institute of Precision Engineering,XJTUParallel lightMaskPhotoresistParallel lightMaskPhotoresistContact Exposure ModesSoft contact(adjustable mechanical pressure)Hard contact(additional nitrogen pressure)Vacuum contact(evacuation of exposure gap)Soft vacuum(vacuum contact with additional nitroge

7、n pressure)Mechanical pressureN2Mechanical pressureVacVacMechanical pressureMaskChuckMechanical pressureVacN2西安交通大学精密工程研究所西安交通大学精密工程研究所 Institute of Precision Engineering,Xian Jiaotong University Institute of Precision Engineering,Xian Jiaotong University微型机电系统课程系列之三微型机电系统课程系列之三Institute of Precisio

8、n Engineering,XJTU微型机电系统课程系列之三Institute of Precision Engineering,XJTU微型机电系统课程系列之三Institute of Precision Engineering,XJTU微型机电系统课程系列之三Institute of Precision Engineering,XJTU微型机电系统课程系列之三Institute of Precision Engineering,XJTU1 1Basic of PhotolithographyBasic of Photolithography2 2Mask FabricationMask F

9、abrication3 3Mask AlignerMask Aligner4 4Photolithography ProcessPhotolithography Process5 5Results JudgementResults Judgement微型机电系统课程系列之三Institute of Precision Engineering,XJTU基底清洗匀胶前烘曝光显影后烘烘干中烘漂洗微型机电系统课程系列之三Institute of Precision Engineering,XJTU西安交通大学精密工程研究所西安交通大学精密工程研究所 Institute of Precision Eng

10、ineering,Xian Jiaotong University Institute of Precision Engineering,Xian Jiaotong University微型机电系统课程系列之三010203040506005001000150020002500Speed(rpm)Resist Thickness(m)Medium Thicknesses of AZ4562:30 s Spin TimeResults for polished silicon,thickness depends on ambient humidityand surface preparation

11、西安交通大学精密工程研究所西安交通大学精密工程研究所 Institute of Precision Engineering,Xian Jiaotong University Institute of Precision Engineering,Xian Jiaotong University微型机电系统课程系列之三Very Thick Layers of AZ4562 in One Step:Acceleration 1 000 rpm/s020406080100120051015202530Spin Time(s)Resist Thickness(m)300 rpm400 rpm500 rp

12、m 西安交通大学精密工程研究所西安交通大学精密工程研究所 Institute of Precision Engineering,Xian Jiaotong University Institute of Precision Engineering,Xian Jiaotong University微型机电系统课程系列之三微型机电系统课程系列之三Institute of Precision Engineering,XJTU1 1Basic of PhotolithographyBasic of Photolithography2 2Mask FabricationMask Fabrication3

13、 3Mask AlignerMask Aligner4 4Photolithography ProcessPhotolithography Process5 5Result JudgementResult Judgement微型机电系统课程系列之三Institute of Precision Engineering,XJTU微型机电系统课程系列之三Institute of Precision Engineering,XJTUDose:HighDeveloper:LowDose:LowDeveloper:HighDose:MediumDeveloper:ModeratePRSubstrate微型机电系统课程系列之三Institute of Precision Engineering,XJTUThank you.